The needs to deposit homogeneous and well define layers of silicon or carbon on planar system as well as on powder made the design of a CVD reactor challenging. A hot wall Low-Pressure CVD reactor was chosen.



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LPCVD is known to provide well define and reproducible coating. The reactor was also build to allow the use of a rotating part for homogeneous deposition on powder without changing the main part of the reactor. It is then possible easily and quickly switch between deposition on planar system or powder.